• 

SiC wafer holder for ICP etching process in LED industry

Design features:
1.High abrasion resistance, high surface accuracy
2.Excellent corrosion resitance, high hardness
3.Antioxidant with long service life
4. High temperature resistance

Inquiry

Contact: * Company: MSN/skype: Subject: Tel: Fax: E-mail: * Website: Content: * Code: *(marked *should be filled)

SiC wafer holder for ICP etching process in LED industryApplication:

SiC plate is used as a wafer holder for PSS (pattern sapphire substrate) etching process in LED industries.

Feature requirements:

1.      Thermal conductivity

2.      Resistant to plasma bombardment

3.      Good temperature uniformity

Why is better than others:

1.      Available in various specifications, also providing customized services

2.      Stable quality and fast delivery

3.      High cost-performance ratio and competitive

4.      Extensive experience in making trays